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and Maintainability (RAM) and Utilization
lifetimes measured by the SPV method are often shorter than the lifetimes measured by the PCD method because the photoconductivity can contain contributions from majority as well as minority carriers
2 mm) Diameter Polished Monocrystalline Indium Phosphide Wafers
本文書の目的は，半導体産業で使用されるトリメチルホスフィンに対する要求条件を標準化し，またこれらのスタンダードをサポートする試験手順を標準化することである。試験方法は，統計的に有効な結果を示している。
SEMI M20-0998 (technical revision)
M07100 - SEMI M71 - CMOS LSI用シリコン・オン・インシュレーター（SOI）ウェーハのための仕様 Lang-English and Maintainability (RAM) and Utilizationglobal Silicon Wafer Committee2010120global Audits and Reviews Subcommittee20102www. semi. org200711 CMOSLSI large scale integrated circuitSOI silicon on insulator130nm65nm45nmLSI200mm300mm150mmLSI Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M35 Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated